Publications

Adomaitis research group publications

Books

Numerical Methods for Chemical Engineers: A MATLAB-based Approach by Raymond A. Adomaitis is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License
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EuroCVD 17 / CVD 17, Parts 1 and 2, M. T. Swihart, D. Barreca, R. A. Adomaitis, and K. Worhoff, Ed., ECS Transactions, Vol. 25, No. 8 (2009)
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Journal and other peer-reviewed publications

Salami, H., K. Ramakrishnan, and R. A. Adomaitis, “Reaction Path Analysis for Chemical Vapor Deposition and Atomic Layer Deposition Processes: A Study of Titania Thin-Fi lm Deposition,” Physica Status Solidi B, (2017) DOI: 10.1002/pssb.201700091 Link
Adomaitis, R. A. “Reaction Path Analysis for Atomic Layer Deposition Processes,” Proc. FOCAPO / CPC 2017, Tucson, AZ, (2017) PDF
Salami, H., A. Poissant, and R. A. Adomaitis, “Anomalously High Alumina Atomic Layer Deposition Growth per Cycle During Trimethylaluminum Under-dosing Conditions,” J. Vac. Sci. Tech. A 35 (2017) 01B101 DOI: 10.1116/1.4963368 Link
Adomaitis, R. A. “Dynamic Dimension Reduction for Thin-film Deposition Reaction Network Models,” Proc. IFAC DYCOPS-CAB 2016, Trondheim, Norway (2016) 448-453 PDF
Adomaitis, R. A. “Dynamic Order Reduction of Thin-film Deposition Kinetics Models: a Reaction Factorization Approach,” J. Vac. Sci. Tech. A 34 (2016) 01A104 DOI: 10.1116/1.4930591 Link
Adomaitis, R. A. “Time-Scale Analysis of Atomic Layer Deposition Processes: Predicting the Transition from Mass-Transfer to Kinetically Limited Regimes,” Physica Status Solidi C, 12 (2015) 934-943, DOI: 10.1002/pssc.201510048 Link
Remmers, E. M., C. D. Travis, and R. A. Adomaitis, “Reaction Factorization for the Dynamic Analysis of Atomic Layer Deposition Kinetics,” Chemical Engineering Science 127 (2015) 374-391 DOI: 10.1016/j.ces.2015.01.051 Link
Travis, C. D. and R. A. Adomaitis, “Modeling Alumina Atomic Layer Deposition Reaction Kinetics During the Trimethylaluminum Exposure,” Theoretical Chemistry Accounts 133 (2013) 1414, DOI: 10.1007/s00214-013-1414-0 Link
Travis, C. D. and R. A. Adomaitis, “Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor,” Processes 1 (2013) 128-152, DOI: 10.3390/pr1020128 Link
Travis, C. D. and R. A. Adomaitis, “Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory,” Chemical Vapor Deposition 19 (2013) 4-14, DOI: 10.1002/cvde.201206985 Link
Adomaitis, R. A. and A. Schwarm “Systems and Control Challenges in Photovoltaic Manufacturing Processes: A Modeling Strategy for Passivation and Anti-reflection Films,” Computers & Chemical Engineering 51 (2013) 65-76, DOI: 10.1016/j.compchemeng.2012.06.043 Link
Adomaitis, R. A. “A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High Aspect-Ratio Nanopores,” Chemical Vapor Deposition, 17 (2011) 353-365, DOI: 10.1002/cvde.201106922 PDF
Adomaitis, R. A. “Ballistic Transport and Reaction Modeling of Atomic Layer Deposition Manufacturing Processes,” Proc. 2011 IFAC World Congress, Milan (2011) PDF
Arana-Chavez, D., E. Toumayan, F. Lora, C. McCaslin, and R. A. Adomaitis “Modeling the Transport and Reaction Mechanisms of Copper Oxide CVD,” Chemical Vapor Deposition 16 (2010) 336-345, DOI: 10.1002/cvde.201006873 PDF
Adomaitis, R. A. “Development of a Multiscale Model for an Atomic Layer Deposition Process,” J. Crystal Growth 312 (2010) 1449-1452, DOI: 10.1016/j.jcrysgro.2009.12.041 PDF
Guglietta, G. T. Wanga, R. Pati, S. Ehrman, and R. A. Adomaitis “Chemical Vapor Deposition of Copper Oxide Films for Photoelectrochemical Hydrogen Production,” Proc. of SPIE Vol. 7408 740807-1, Solar Hydrogen and Nanotechnology IV, F. Osterloh, Ed. (2009) PDF
Dwivedi, V. and R. A. Adomaitis “Multiscale Simulation and Optimization of an Atomic Layer Deposition Process in a Nanoporous Material,” ECS Transactions 25 (2009) 115-122, DOI: 10.149/1.3207582 PDF
Leon, M. del Pilar and R. A. Adomaitis “Full Wafer Mapping and Response Surface Modeling Techniques for Thin Film Deposition Processes,” J. Crystal Growth 311 (2009) 3399-3408 PDF
Oliver, J. D., B. H. Ponczak, R. P. Parikh, and R. A. Adomaitis “Uniformity Improvement of Planetary Epitaxial Growth Processes through Analysis of Intentionally Stalled SiC Wafers,” Mat. Sci. Forum, 615-617 (2009) 101-104 PDF
Adomaitis, R. A. “The Nearest Uniformity Producing Profile (NUPP) Optimization Criterion for Thin-Film Processing Applications,” J. Process Control 18 (2008) 922-930 PDF
Sreenivasan, R., R. A. Adomaitis, and G. W. Rubloff “A Comparative Study of Reactor Designs for the Production of Graded Films with Applications to Combinatorial CVD,” J. Crystal Growth 310 (2008) 270-283 PDF
Adomaitis, R. A. “Intentionally Patterned and Spatially Non-Uniform Film Profiles in Chemical Vapor Deposition Processes,” Surface and Coatings Technology 201 (2007) 9025-9029 PDF
Cai, Y., L. Henn-Lecordier, G. W. Rubloff, R. Sreenivasan, J.-O. Choo, and R. A. Adomaitis, “Multiplexed Mass Spectrometric Sensing in a Spatially Programmable Chemical Vapor Deposition System,” J. Vac. Sci. Tech. B 25 (2007) 1288-1297 PDF
Adomaitis, R. A., I. G. Kevrekidis, and R. de la Llave, “A Computer-Assisted Study of Global Dynamic Transitions for a Non-Invertible System,” Int. J. Bifurcation Chaos 17 (2007) 1305-1321 PDF
Adomaitis, R. A. “The Trouble with Spurious Eigenvalues,” Int. J. Bifurcation Chaos 17 (2007) 1375-1381 PDF
Parikh, R. P., R. A. Adomaitis, J. D. Oliver, and B. H. Ponczak “Implementation of a Geometrically-based Criterion for Film Uniformity Control in a Planetary SiC CVD Reactor System,” J. Process Control 17 (2007) 477-488 PDF
Parikh, R. P., R. A. Adomaitis, M. E. Aumer, D. Partlow, D. Thomson, and G. W. Rubloff, “Validating Gallium Nitride Growth Kinetics Using a Precursor Delivery Showered as a Novel Chemical Reactor,” J. Crystal Growth 296 (2006) 15-26 PDF
Sreenivasan, R. R. A. Adomaitis, and G. W. Rubloff, “A Demonstration of Spatially Programmable Chemical Vapor Deposition: Model-Based Uniformity/Non-uniformity Control.” J. Vac. Sci. Tech. B 24 (2006) 2706-2715 PDF
Chen, J. and R. A. Adomaitis “An Object-Oriented Framework for Modular Chemical Process Simulation with Semiconductor Processing Applications,” Computers & Chem. Eng, 30 (2006) 1354-1380 PDF
Parikh, R. P. and R. A. Adomaitis “An Overview of Gallium Nitride Growth Chemistry and its Effect on Reactor Design: Application to a Planetary Radial-Flow CVD System,” J. Crystal Growth 286 (2006) 259-278 PDF
Cho, S. G. W. Rubloff, M. E. Aumer, D. B. Thomson, D. P. Partlow, R. Parikh, and R. A. Adomaitis “In-situ Chemical Sensing in AlGaN/GaN HEMT MOCVD Process for Real-Time Prediction of Product Crystal Quality and Advanced Process Control,” J. Vac. Sci. Tech. B 23 (4) (2005) 1386-1397 PDF
Choo, J. O., R. A. Adomaitis, L. Henn-Lecordier, Y. Cai, and G. W. Rubloff “Development of a Spatially Controllable Chemical Vapor Deposition Reactor with Combinatorial Processing Capabilities,” Review of Scientific Instruments, 76, 062217 (2005) PDF
Adomaitis, R. A. “Identification of a Deposition Rate Profile Subspace Corresponding to Spatially-Uniform Films in Planetary CVD Reactors: A New Criterion for Uniformity Control,” Computers & Chem. Eng, 29 (2005) 829-837 PDF
Choo, J. O., R. A. Adomaitis, G. W. Rubloff, L. Henn-Lecordier, and Y. Liu “Simulation-Based Design and Experimental Evaluation of a Spatially Controllable Chemical Vapor Deposition Reactor,” AIChE Journal, 51 (2005) 572-584. PDF
Adomaitis, R. A. “A Reduced-Basis Discretization Method for Chemical Vapor Deposition Reactor Simulation,” Mathematical and Computer Modeling, 38 (2003) 159-175 PDF
Adomaitis, R. A. “Objects for MWR,” Computers & Chem. Eng, 26 (2002) 981-998 PDF
Adomaitis, R. A. “Spectral Filtering for Improved Performance of Collocation Discretization Methods,” Computers & Chem. Eng, 25 (2001) 1621-1632 PDF
Lin, Y.-h. and R. A. Adomaitis, “Simulation and Model Reduction Methods for an RF Plasma Glow Discharge,” Journal of Computational Physics, 171 (2001) 731-752 PDF
Chang, H. -Y., R. A. Adomaitis, J. N. Kidder, Jr., and G. W. Rubloff, “Influence of Gas Composition on Wafer Temperature in a Tungsten Chemical Vapor Deposition Reactor: Experimental Measurements, Model Development, and Parameter Estimation,” J. Vac. Sci. Tech. B, 19 (2001) 230-238; also ISR TR 2000-09 PDF
Rico-Martinez, R., R. A. Adomaitis, and I. G. Kevrekidis, “Noninvertibility in Neural Networks,” Computers & Chem. Eng, 24 (2000) 2417-2433 PDF
Adomaitis, R. A. and Y. -h. Lin, “A Collocation/Quadrature-Based Sturm-Liouville Problem Solver,” Applied Math. and Computation, 110 (2000); 205-223; also ISR TR 99-1 n.a.
Adomaitis, R. A., Y. -h. Lin, and H. -Y. Chang, “A Computational Framework for Boundary-Value Problem Based Simulations,” Simulation, 74 (2000) 28-38. PDF
Lin, Y. -h., H. -Y. Chang, and R. A. Adomaitis, “MWRtools: A Library for Weighted Residual Method Calculations” Computers & Chem. Eng, 23 (1999) 1041-1061; also ISR TR 98-24 PDF
Theodoropoulou, A., E. Zafiriou, and R. A. Adomaitis, “Inverse Model Based Real-Time Control for Temperature Uniformity of RTCVD,” IEEE Trans. Semicond. Manuf., 12 (1999) 87-101. PDF
Chang, H. -Y. and R. A. Adomaitis, “Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach,” Int. J. Heat Fluid Flow, 20 (1999) 74-83; also ISR TR 97-84 PDF
Lin, Y. -h. and R. A. Adomaitis, “A Global Basis Function Approach to DC Glow Discharge Simulation,” Phys. Lett. A, 243 (1998) 142-150; also ISR TR 97-81 PDF
Adomaitis, R. A. and Y. -h. Lin, “A Technique for Accurate Collocation Residual Calculations,” Chem. Engng J., 71 (1998) 127-134; also ISR TR 98-6 PDF
Theodoropoulou, A., R. A. Adomaitis, and E. Zafiriou, “Model Reduction for RTCVD Optimization,” IEEE Trans. Semicond. Manuf. 11 (1998) 85-98; also ISR TR 97-78 PDF